Influence of Thermal Annealings in Argon on the Structural and Thermochromic Properties of MoO 3 Thin Films
- M. A. Arvizu(corresponding author),
- ,
- M. Pérez-González,
- E. Campos-Gonzalez,
- O. Zelaya-Angel,
- S. A. Tomás
- Centro de Investigacion y de Estudios Avanzados del Instituto Politécnico Nacional,
- Uppsala University,
- Programa de Nanociencias y Nanotecnología,
- Universidad Autonoma Queretaro
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Abstract
The effect of thermal annealing in an inert atmosphere (argon) on the structural and thermochromic properties of MoO 3 thin films was investigated. MoO 3 thin films were deposited by thermal evaporation in vacuum of MoO 3 powders. X-ray diffraction patterns of the films showed the presence of the monoclinic Magneli phase Mo 9O 26 for annealing temperatures above 250∘C. Absorbance spectra of the films annealed in argon indicated that their thermochromic response increases with the annealing temperature in the analyzed range (23 ∘C –300 ∘C), a result opposite to the case of thermal annealings in air, for which case the thermochromic response shows a maximum value around 200 ∘C–225 ∘C and decreases for higher temperatures. These results are explained in terms of a higher density of oxygen vacancies formed upon thermal treatments in inert atmospheres.
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Original language
EnglishArticle number
51Journal (Volume, Issue Number)
International Journal of Thermophysics (Volume 38, Issue 4)Publication milestones
- Published - 01/04/2017
Publication status
ISSN
0195-928XPublication IDs
- Scopus: 85013103874