Enhanced photocatalytic activity of TiO2-ZnO thin films deposited by dc reactive magnetron sputtering

M. Pérez-González*, S. A. Tomás, J. Santoyo-Salazar, M. Morales-Luna

*Autor correspondiente de este trabajo

Producción científicarevisión exhaustiva

64 Citas (Scopus)

Resumen

The effect of deposition conditions on the photocatalytic activity of TiO2-ZnO thin films was studied. By using a (Ti)90-(Zn)10 alloy target, the samples were deposited at room temperature on glass substrates by dc reactive magnetron sputtering and post-annealed in air at 500 °C. The dependence of the physical properties of the films on the O2/Ar gas ratio and the deposition working pressure was investigated. XRD patterns showed mainly the formation of the anatase phase of TiO2. Optical absorption measurements exhibited a blue shift of the band-gap energy with increasing working pressure. XPS spectra indicated the presence of the Ti4+ and Zn2+ oxidation states, which correspond to TiO2 and ZnO, respectively. The chemical state of Ti was further analyzed by means of the modified Auger parameter, α’, which gave a value of ca. 873 eV. The photocatalytic property of the films was assessed by the degradation of a methylene blue aqueous solution. The maximum photocatalytic performance was observed for the samples deposited at 3.0 mTorr and O2/Ar gas ratio of 10/90. These results are explained in terms of the structural, optical, and morphological properties of the films.

Idioma originalEnglish
Páginas (desde-hasta)8831-8838
Número de páginas8
PublicaciónCeramics International
Volumen43
N.º12
DOI
EstadoPublished - 15 ago 2017
Publicado de forma externa

Nota bibliográfica

Publisher Copyright:
© 2017 Elsevier Ltd and Techna Group S.r.l.

All Science Journal Classification (ASJC) codes

  • Materiales electrónicos, ópticos y magnéticos
  • Cerámicos y compuestos
  • Química de procesos y tecnología
  • Superficies, recubrimientos y láminas
  • Química de los materiales

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