TY - JOUR
T1 - Enhanced photocatalytic activity of amorphous MoO3 thin films deposited by rf reactive magnetron sputtering
AU - Ponce-Mosso, M.
AU - Pérez-González, M.
AU - García-Tinoco, P. E.
AU - Crotte-Ledesma, H.
AU - Morales-Luna, M.
AU - Tomás, S. A.
N1 - Funding Information:
This work was supported by CONACyT (Mexico) under projects No. 168605 and 205733. The authors are grateful to J. Santoyo-Salazar for enlightening discussions. Technical assistance was received from E. Ayala and M. Guerrero. M. Ponce-Mosso gratefully acknowledges the scholarship grant from CONACyT-SNI under the “Ayudantes de Investigador Nacional Nivel III” program.
Publisher Copyright:
© 2018 Elsevier B.V.
Copyright:
Copyright 2020 Elsevier B.V., All rights reserved.
PY - 2020/6/1
Y1 - 2020/6/1
N2 - The photocatalytic activity of molybdenum trioxide (MoO3) thin films was studied. The MoO3 thin films were deposited on Corning glass substrates by radio frequency reactive magnetron sputtering using a metallic Mo target. The dependence of the physical properties of the metal oxides on the sputtering power and working pressure was investigated. X-ray diffraction patterns of the films revealed the formation of amorphous structures. From optical absorption spectra, the band-gap energy was obtained in the range 2.8–3.0 eV for most compounds, while this parameter decreased down to 1.64 eV for samples deposited at 4.5 mTorr and 80 W. X-ray photoelectron spectra disclosed signals associated with the Mo6+, Mo5+, and Mo4+ oxidation states, which correspond to MoO3 and other substoichiometric molybdenum oxides. The photodegradation of a methylene blue (MB) aqueous solution was chosen to evaluate the photocatalytic performance of the thin films. There was found a dependence of the photocatalytic activity on the working pressure, with the samples deposited at 8.0 mTorr and 40 W displaying the highest MB removal.
AB - The photocatalytic activity of molybdenum trioxide (MoO3) thin films was studied. The MoO3 thin films were deposited on Corning glass substrates by radio frequency reactive magnetron sputtering using a metallic Mo target. The dependence of the physical properties of the metal oxides on the sputtering power and working pressure was investigated. X-ray diffraction patterns of the films revealed the formation of amorphous structures. From optical absorption spectra, the band-gap energy was obtained in the range 2.8–3.0 eV for most compounds, while this parameter decreased down to 1.64 eV for samples deposited at 4.5 mTorr and 80 W. X-ray photoelectron spectra disclosed signals associated with the Mo6+, Mo5+, and Mo4+ oxidation states, which correspond to MoO3 and other substoichiometric molybdenum oxides. The photodegradation of a methylene blue (MB) aqueous solution was chosen to evaluate the photocatalytic performance of the thin films. There was found a dependence of the photocatalytic activity on the working pressure, with the samples deposited at 8.0 mTorr and 40 W displaying the highest MB removal.
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U2 - 10.1016/j.cattod.2018.04.065
DO - 10.1016/j.cattod.2018.04.065
M3 - Article
AN - SCOPUS:85046712013
VL - 349
SP - 150
EP - 158
JO - Catalysis Today
JF - Catalysis Today
SN - 0920-5861
ER -