Characterization of the microlithography and mercury drop methods to generate PDI's

J.A. Zenteno-Hernández, F.S. Granados-Agustín, D. Aguirre-Aguirre, B. Villalobos-Mendoza, M.E. Percino-Zacarías, P. Rosales-Quintero, A. Cornejo-Rodriguez

Resultado de la investigación

Resumen

In this work, we compare two techniques to make point-diffraction interferometers (PDI): microlithography and the mercury drop method to know with which of these the best results can be obtained. For the comparison, we used the wavefront generated by a commercial reference surface of /20 analyzing the interference pattern generated by the PDIs, we obtained information from the wavefront generated by the pinhole. Several PDIs were created and analyzed to have a statistical error information of both techniques.

Idioma originalEnglish
Título de la publicación alojadaOptical Manufacturing and Testing XII
EditoresRay Williamson, Dae Wook Kim, Rolf Rascher
Páginas55
ISBN (versión digital)9781510620551
DOI
EstadoPublished - 1 ene 2018
Publicado de forma externa

Serie de la publicación

NombreProceedings of SPIE - The International Society for Optical Engineering
Volumen10742
ISSN (versión impresa)0277-786X
ISSN (versión digital)1996-756X

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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