Mass transfer study on improved chemistry for electrodeposition of copper indium gallium selenide (Cigs) compound for photovoltaics applications

Mahfouz Saeed*, Omar Israel González Peña*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

3 Citations (Scopus)

Abstract

Copper indium gallium selenium (CIGS) films are attractive for photovoltaic applications due to their high optical absorption coefficient. The generation of CIGS films by electrodeposition is particularly appealing due to the relatively low capital cost and high throughput. Numerous publications address the electrodeposition of CIGS; however, very few recognize the critical significance of transport in affecting the composition and properties of the compound. This study introduces a new electrolyte composition, which is far more dilute than systems that had been previously described, which yields much improved CIGS films. The electrodeposition experiments were carried out on a rotating disk electrode, which provides quantitative control of the transport rates. Experiments with the conventional electrolyte, ten times more concentrated than the new electrolyte proposed here, yielded powdery and non-adherent deposit. By contrast, the new, low concentration electrolyte produced in the preferred potential interval of −0.64 ≤ E ≤ −0.76 V vs. NHE, a smooth and adherent uniform deposit with the desired composition across a broad range of rotation speeds. The effects of mass transport on the deposit are discussed. Sample polarization curves at different electrode rotation rates, obtained in deposition experiments from the high and the low concentration electrolytes, are critically compared. Characterization of the overall efficiency, quantum efficiency, open circuit voltage, short circuit current, dark current, band gap, and the fill factor are reported.

Original languageEnglish
Article number1222
JournalNanomaterials
Volume11
Issue number5
DOIs
Publication statusPublished - May 2021
Externally publishedYes

Bibliographical note

Publisher Copyright:
© 2021 by the authors. Licensee MDPI, Basel, Switzerland.

All Science Journal Classification (ASJC) codes

  • General Chemical Engineering
  • General Materials Science

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