Improved adsorption and photocatalytic removal of methylene blue by MoO3 thin films: Role of the sputtering power, film thickness, and sputtering working pressure

M. Pérez-González, M. Morales-Luna, J. Santoyo-Salazar, H. Crotte-Ledesma, P. E. García-Tinoco, S. A. Tomás

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

The role of the sputtering power, film thickness, and sputtering working pressure on the adsorption capacity and photocatalytic activity of MoO3 thin films was studied. The MoO3 thin films were deposited at room temperature by radio frequency reactive magnetron sputtering and subsequently post-annealed in air at 500 °C. X-ray diffractograms revealed the presence of the α- and β-MoO3 crystalline phases. The thin film adsorption was assessed by the removal of methylene blue (MB) from aqueous solutions under dark conditions. In addition, the photocatalytic activity for the most adsorbent films was evaluated by the degradation of MB aqueous solutions under UV-irradiation. Raman spectroscopy measurements showed a strong MB adsorption on the film surface. Photoacoustic spectroscopy experiments confirmed the adsorption of MB on the catalyst surface; specifically, a strong hypsochromic shift of the absorption bands indicated that MB forms aggregates on the MoO3 surface. The maximum adsorption and photocatalytic performances were observed for the samples deposited at 60 W and 12.0 mTorr, with a thickness of 400 nm. The results are explained in terms of the stoichiometry, as well as the structural, optical, and morphological properties of the films.

Original languageEnglish
JournalCatalysis Today
DOIs
Publication statusAccepted/In press - 1 Jan 2019
Externally publishedYes

Fingerprint

Methylene Blue
Sputtering
Film thickness
Adsorption
Thin films
Photoacoustic spectroscopy
Reactive sputtering
Stoichiometry
Magnetron sputtering
Adsorbents
Raman spectroscopy
Absorption spectra
molybdenum trioxide
Irradiation
Crystalline materials
Degradation
X rays
Catalysts
Air
Experiments

All Science Journal Classification (ASJC) codes

  • Catalysis
  • Chemistry(all)

Cite this

@article{27a8e73b59774a29b2f700d672a3ae72,
title = "Improved adsorption and photocatalytic removal of methylene blue by MoO3 thin films: Role of the sputtering power, film thickness, and sputtering working pressure",
abstract = "The role of the sputtering power, film thickness, and sputtering working pressure on the adsorption capacity and photocatalytic activity of MoO3 thin films was studied. The MoO3 thin films were deposited at room temperature by radio frequency reactive magnetron sputtering and subsequently post-annealed in air at 500 °C. X-ray diffractograms revealed the presence of the α- and β-MoO3 crystalline phases. The thin film adsorption was assessed by the removal of methylene blue (MB) from aqueous solutions under dark conditions. In addition, the photocatalytic activity for the most adsorbent films was evaluated by the degradation of MB aqueous solutions under UV-irradiation. Raman spectroscopy measurements showed a strong MB adsorption on the film surface. Photoacoustic spectroscopy experiments confirmed the adsorption of MB on the catalyst surface; specifically, a strong hypsochromic shift of the absorption bands indicated that MB forms aggregates on the MoO3 surface. The maximum adsorption and photocatalytic performances were observed for the samples deposited at 60 W and 12.0 mTorr, with a thickness of 400 nm. The results are explained in terms of the stoichiometry, as well as the structural, optical, and morphological properties of the films.",
author = "M. P{\'e}rez-Gonz{\'a}lez and M. Morales-Luna and J. Santoyo-Salazar and H. Crotte-Ledesma and Garc{\'i}a-Tinoco, {P. E.} and Tom{\'a}s, {S. A.}",
year = "2019",
month = "1",
day = "1",
doi = "10.1016/j.cattod.2019.06.003",
language = "English",
journal = "Catalysis Today",
issn = "0920-5861",
publisher = "Elsevier",

}

Improved adsorption and photocatalytic removal of methylene blue by MoO3 thin films : Role of the sputtering power, film thickness, and sputtering working pressure. / Pérez-González, M.; Morales-Luna, M.; Santoyo-Salazar, J.; Crotte-Ledesma, H.; García-Tinoco, P. E.; Tomás, S. A.

In: Catalysis Today, 01.01.2019.

Research output: Contribution to journalArticle

TY - JOUR

T1 - Improved adsorption and photocatalytic removal of methylene blue by MoO3 thin films

T2 - Role of the sputtering power, film thickness, and sputtering working pressure

AU - Pérez-González, M.

AU - Morales-Luna, M.

AU - Santoyo-Salazar, J.

AU - Crotte-Ledesma, H.

AU - García-Tinoco, P. E.

AU - Tomás, S. A.

PY - 2019/1/1

Y1 - 2019/1/1

N2 - The role of the sputtering power, film thickness, and sputtering working pressure on the adsorption capacity and photocatalytic activity of MoO3 thin films was studied. The MoO3 thin films were deposited at room temperature by radio frequency reactive magnetron sputtering and subsequently post-annealed in air at 500 °C. X-ray diffractograms revealed the presence of the α- and β-MoO3 crystalline phases. The thin film adsorption was assessed by the removal of methylene blue (MB) from aqueous solutions under dark conditions. In addition, the photocatalytic activity for the most adsorbent films was evaluated by the degradation of MB aqueous solutions under UV-irradiation. Raman spectroscopy measurements showed a strong MB adsorption on the film surface. Photoacoustic spectroscopy experiments confirmed the adsorption of MB on the catalyst surface; specifically, a strong hypsochromic shift of the absorption bands indicated that MB forms aggregates on the MoO3 surface. The maximum adsorption and photocatalytic performances were observed for the samples deposited at 60 W and 12.0 mTorr, with a thickness of 400 nm. The results are explained in terms of the stoichiometry, as well as the structural, optical, and morphological properties of the films.

AB - The role of the sputtering power, film thickness, and sputtering working pressure on the adsorption capacity and photocatalytic activity of MoO3 thin films was studied. The MoO3 thin films were deposited at room temperature by radio frequency reactive magnetron sputtering and subsequently post-annealed in air at 500 °C. X-ray diffractograms revealed the presence of the α- and β-MoO3 crystalline phases. The thin film adsorption was assessed by the removal of methylene blue (MB) from aqueous solutions under dark conditions. In addition, the photocatalytic activity for the most adsorbent films was evaluated by the degradation of MB aqueous solutions under UV-irradiation. Raman spectroscopy measurements showed a strong MB adsorption on the film surface. Photoacoustic spectroscopy experiments confirmed the adsorption of MB on the catalyst surface; specifically, a strong hypsochromic shift of the absorption bands indicated that MB forms aggregates on the MoO3 surface. The maximum adsorption and photocatalytic performances were observed for the samples deposited at 60 W and 12.0 mTorr, with a thickness of 400 nm. The results are explained in terms of the stoichiometry, as well as the structural, optical, and morphological properties of the films.

UR - http://www.scopus.com/inward/record.url?scp=85067297310&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=85067297310&partnerID=8YFLogxK

U2 - 10.1016/j.cattod.2019.06.003

DO - 10.1016/j.cattod.2019.06.003

M3 - Article

AN - SCOPUS:85067297310

JO - Catalysis Today

JF - Catalysis Today

SN - 0920-5861

ER -