Enhanced photocatalytic activity of amorphous MoO3 thin films deposited by rf reactive magnetron sputtering

M. Ponce-Mosso; M. Pérez-González; P. E. García-Tinoco; H. Crotte-Ledesma; M. Morales-Luna; S. A. Tomás

doi:10.1016/j.cattod.2018.04.065

Enhanced photocatalytic activity of amorphous MoO₃ thin films deposited by rf reactive magnetron sputtering

M. Ponce-Mosso, M. Pérez-González^*, P. E. García-Tinoco, H. Crotte-Ledesma, M. Morales-Luna, S. A. Tomás

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

42 Citations (Scopus)

Abstract

The photocatalytic activity of molybdenum trioxide (MoO₃) thin films was studied. The MoO₃ thin films were deposited on Corning glass substrates by radio frequency reactive magnetron sputtering using a metallic Mo target. The dependence of the physical properties of the metal oxides on the sputtering power and working pressure was investigated. X-ray diffraction patterns of the films revealed the formation of amorphous structures. From optical absorption spectra, the band-gap energy was obtained in the range 2.8–3.0 eV for most compounds, while this parameter decreased down to 1.64 eV for samples deposited at 4.5 mTorr and 80 W. X-ray photoelectron spectra disclosed signals associated with the Mo⁶⁺, Mo⁵⁺, and Mo⁴⁺ oxidation states, which correspond to MoO₃ and other substoichiometric molybdenum oxides. The photodegradation of a methylene blue (MB) aqueous solution was chosen to evaluate the photocatalytic performance of the thin films. There was found a dependence of the photocatalytic activity on the working pressure, with the samples deposited at 8.0 mTorr and 40 W displaying the highest MB removal.

Original language	English
Pages (from-to)	150-158
Number of pages	9
Journal	Catalysis Today
Volume	349
DOIs	https://doi.org/10.1016/j.cattod.2018.04.065
Publication status	Published - 1 Jun 2020
Externally published	Yes

Bibliographical note

Funding Information:
This work was supported by CONACyT (Mexico) under projects No. 168605 and 205733. The authors are grateful to J. Santoyo-Salazar for enlightening discussions. Technical assistance was received from E. Ayala and M. Guerrero. M. Ponce-Mosso gratefully acknowledges the scholarship grant from CONACyT-SNI under the “Ayudantes de Investigador Nacional Nivel III” program.

Publisher Copyright:
© 2018 Elsevier B.V.

Copyright:
Copyright 2020 Elsevier B.V., All rights reserved.

All Science Journal Classification (ASJC) codes

Catalysis
Chemistry(all)

Access to Document

10.1016/j.cattod.2018.04.065

Cite this

@article{da5e6c244a0f4d1caee9b2780fba3a99,

title = "Enhanced photocatalytic activity of amorphous MoO3 thin films deposited by rf reactive magnetron sputtering",

abstract = "The photocatalytic activity of molybdenum trioxide (MoO3) thin films was studied. The MoO3 thin films were deposited on Corning glass substrates by radio frequency reactive magnetron sputtering using a metallic Mo target. The dependence of the physical properties of the metal oxides on the sputtering power and working pressure was investigated. X-ray diffraction patterns of the films revealed the formation of amorphous structures. From optical absorption spectra, the band-gap energy was obtained in the range 2.8–3.0 eV for most compounds, while this parameter decreased down to 1.64 eV for samples deposited at 4.5 mTorr and 80 W. X-ray photoelectron spectra disclosed signals associated with the Mo6+, Mo5+, and Mo4+ oxidation states, which correspond to MoO3 and other substoichiometric molybdenum oxides. The photodegradation of a methylene blue (MB) aqueous solution was chosen to evaluate the photocatalytic performance of the thin films. There was found a dependence of the photocatalytic activity on the working pressure, with the samples deposited at 8.0 mTorr and 40 W displaying the highest MB removal.",

author = "M. Ponce-Mosso and M. P{\'e}rez-Gonz{\'a}lez and Garc{\'i}a-Tinoco, {P. E.} and H. Crotte-Ledesma and M. Morales-Luna and Tom{\'a}s, {S. A.}",

note = "Funding Information: This work was supported by CONACyT (Mexico) under projects No. 168605 and 205733. The authors are grateful to J. Santoyo-Salazar for enlightening discussions. Technical assistance was received from E. Ayala and M. Guerrero. M. Ponce-Mosso gratefully acknowledges the scholarship grant from CONACyT-SNI under the “Ayudantes de Investigador Nacional Nivel III” program. Publisher Copyright: {\textcopyright} 2018 Elsevier B.V. Copyright: Copyright 2020 Elsevier B.V., All rights reserved.",

year = "2020",

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doi = "10.1016/j.cattod.2018.04.065",

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AU - Ponce-Mosso, M.

AU - Pérez-González, M.

AU - García-Tinoco, P. E.

AU - Crotte-Ledesma, H.

AU - Morales-Luna, M.

AU - Tomás, S. A.

N1 - Funding Information: This work was supported by CONACyT (Mexico) under projects No. 168605 and 205733. The authors are grateful to J. Santoyo-Salazar for enlightening discussions. Technical assistance was received from E. Ayala and M. Guerrero. M. Ponce-Mosso gratefully acknowledges the scholarship grant from CONACyT-SNI under the “Ayudantes de Investigador Nacional Nivel III” program. Publisher Copyright: © 2018 Elsevier B.V. Copyright: Copyright 2020 Elsevier B.V., All rights reserved.

PY - 2020/6/1

Y1 - 2020/6/1

N2 - The photocatalytic activity of molybdenum trioxide (MoO3) thin films was studied. The MoO3 thin films were deposited on Corning glass substrates by radio frequency reactive magnetron sputtering using a metallic Mo target. The dependence of the physical properties of the metal oxides on the sputtering power and working pressure was investigated. X-ray diffraction patterns of the films revealed the formation of amorphous structures. From optical absorption spectra, the band-gap energy was obtained in the range 2.8–3.0 eV for most compounds, while this parameter decreased down to 1.64 eV for samples deposited at 4.5 mTorr and 80 W. X-ray photoelectron spectra disclosed signals associated with the Mo6+, Mo5+, and Mo4+ oxidation states, which correspond to MoO3 and other substoichiometric molybdenum oxides. The photodegradation of a methylene blue (MB) aqueous solution was chosen to evaluate the photocatalytic performance of the thin films. There was found a dependence of the photocatalytic activity on the working pressure, with the samples deposited at 8.0 mTorr and 40 W displaying the highest MB removal.

AB - The photocatalytic activity of molybdenum trioxide (MoO3) thin films was studied. The MoO3 thin films were deposited on Corning glass substrates by radio frequency reactive magnetron sputtering using a metallic Mo target. The dependence of the physical properties of the metal oxides on the sputtering power and working pressure was investigated. X-ray diffraction patterns of the films revealed the formation of amorphous structures. From optical absorption spectra, the band-gap energy was obtained in the range 2.8–3.0 eV for most compounds, while this parameter decreased down to 1.64 eV for samples deposited at 4.5 mTorr and 80 W. X-ray photoelectron spectra disclosed signals associated with the Mo6+, Mo5+, and Mo4+ oxidation states, which correspond to MoO3 and other substoichiometric molybdenum oxides. The photodegradation of a methylene blue (MB) aqueous solution was chosen to evaluate the photocatalytic performance of the thin films. There was found a dependence of the photocatalytic activity on the working pressure, with the samples deposited at 8.0 mTorr and 40 W displaying the highest MB removal.

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