Enhanced photocatalytic activity of amorphous MoO3 thin films deposited by rf reactive magnetron sputtering

M. Ponce-Mosso, M. Pérez-González, P. E. García-Tinoco, H. Crotte-Ledesma, M. Morales-Luna, S. A. Tomás

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Abstract

The photocatalytic activity of molybdenum trioxide (MoO3) thin films was studied. The MoO3 thin films were deposited on Corning glass substrates by radio frequency reactive magnetron sputtering using a metallic Mo target. The dependence of the physical properties of the metal oxides on the sputtering power and working pressure was investigated. X-ray diffraction patterns of the films revealed the formation of amorphous structures. From optical absorption spectra, the band-gap energy was obtained in the range 2.8–3.0 eV for most compounds, while this parameter decreased down to 1.64 eV for samples deposited at 4.5 mTorr and 80 W. X-ray photoelectron spectra disclosed signals associated with the Mo6+, Mo5+, and Mo4+ oxidation states, which correspond to MoO3 and other substoichiometric molybdenum oxides. The photodegradation of a methylene blue (MB) aqueous solution was chosen to evaluate the photocatalytic performance of the thin films. There was found a dependence of the photocatalytic activity on the working pressure, with the samples deposited at 8.0 mTorr and 40 W displaying the highest MB removal.

Original languageEnglish
JournalCatalysis Today
DOIs
Publication statusAccepted/In press - 1 Jan 2018
Externally publishedYes

All Science Journal Classification (ASJC) codes

  • Catalysis
  • Chemistry(all)

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    Ponce-Mosso, M., Pérez-González, M., García-Tinoco, P. E., Crotte-Ledesma, H., Morales-Luna, M., & Tomás, S. A. (Accepted/In press). Enhanced photocatalytic activity of amorphous MoO3 thin films deposited by rf reactive magnetron sputtering. Catalysis Today. https://doi.org/10.1016/j.cattod.2018.04.065