Electrochromic properties of W1–x–yNixTiyO3 thin films made by DC magnetron sputtering

M. Morales-Luna; M. A. Arvizu; C. G. Granqvist; G. A. Niklasson

doi:10.1016/j.tsf.2016.06.058

Electrochromic properties of W_1–x–yNi_xTi_yO₃ thin films made by DC magnetron sputtering

M. Morales-Luna^*, M. A. Arvizu, C. G. Granqvist, G. A. Niklasson

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

10 Citations (Scopus)

Abstract

We investigated the electrochromic properties of tungsten–nickel–titanium oxide (W_1–x–yNi_xTi_yO₃) thin films. Special emphasis was put on W_0.83–xNi_xTi_0.17O₃ since this composition gave the highest electrochemical durability. The films were deposited onto indium–tin oxide coated glass by reactive DC magnetron sputtering, and cyclic voltammetry as well as optical transmittance measurements were performed in an electrolyte of 1 M LiClO₄ in propylene carbonate. The potential window was chosen so as to cause rapid degradation of the samples. Elemental compositions were obtained by Rutherford backscattering spectroscopy and structural information by X-ray diffraction. We verified that the titanium additive improved the electrochemical durability of tungsten-oxide-based films and also documented that a further addition of nickel was unable to enhance the EC performance to any significant degree.

Original language	English
Pages (from-to)	292-299
Number of pages	8
Journal	Thin Solid Films
Volume	615
DOIs	https://doi.org/10.1016/j.tsf.2016.06.058
Publication status	Published - 30 Sept 2016
Externally published	Yes

Bibliographical note

Publisher Copyright:
© 2016

All Science Journal Classification (ASJC) codes

Electronic, Optical and Magnetic Materials
Surfaces and Interfaces
Surfaces, Coatings and Films
Metals and Alloys
Materials Chemistry

Access to Document

10.1016/j.tsf.2016.06.058

Cite this

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abstract = "We investigated the electrochromic properties of tungsten–nickel–titanium oxide (W1–x–yNixTiyO3) thin films. Special emphasis was put on W0.83–xNixTi0.17O3 since this composition gave the highest electrochemical durability. The films were deposited onto indium–tin oxide coated glass by reactive DC magnetron sputtering, and cyclic voltammetry as well as optical transmittance measurements were performed in an electrolyte of 1 M LiClO4 in propylene carbonate. The potential window was chosen so as to cause rapid degradation of the samples. Elemental compositions were obtained by Rutherford backscattering spectroscopy and structural information by X-ray diffraction. We verified that the titanium additive improved the electrochemical durability of tungsten-oxide-based films and also documented that a further addition of nickel was unable to enhance the EC performance to any significant degree.",

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