Chromogenic MoO3 thin films: thermo-, photo-, and electrochromic response to working pressure variation in rf reactive magnetron sputtering

V. Cruz San Martín, M. Morales-Luna, P. E. García-Tinoco, M. Pérez-González, M. A. Arvizu, H. Crotte-Ledesma, M. Ponce-Mosso, S. A. Tomás

Research output: Contribution to journalArticle

5 Citations (Scopus)

Abstract

The thermochromic, photochromic, and electrochromic properties of molybdenum trioxide (MoO3) thin films were studied. MoO3 thin films were deposited by rf reactive magnetron sputtering and the influence of deposition parameters, i.e. O2/Ar gas ratio and working pressure, on the chromogenic properties was investigated. Thermochromism was induced by annealing the samples in either air or argon in the range 23–300 °C for 2 h. We found that the highest response was obtained for samples grown at 5.3 × 10−1 Pa, although films annealed in air showed a maximum coloration around 250 °C that became bleached above this temperature. As for the annealing in argon, the thermochromic effect increased even at 300 °C. By exposing samples to UV irradiation in air, photochromism could be induced for different intervals ranging from 0 to 3 h. The highest photochromic response was obtained for samples deposited at 1.3 Pa. Cyclic voltammetry for 20 cycles in a 1 M LiClO4 in propylene carbonate solution, inside a glovebox filled with argon, was used to evaluate the electrochromic response. Samples that showed optimum electrochromic response were deposited at 1.6 Pa. These results are explained in terms of the optical, structural, surface chemical composition, and vibrational modes.

Original languageEnglish
Pages (from-to)15486-15495
Number of pages10
JournalJournal of Materials Science: Materials in Electronics
Volume29
Issue number18
DOIs
Publication statusPublished - 1 Sep 2018
Externally publishedYes

Fingerprint

Chromogenics
Argon
Reactive sputtering
Magnetron sputtering
magnetron sputtering
Thin films
thin films
Air
Annealing
Photochromism
argon
air
gloveboxes
Molybdenum
Cyclic voltammetry
Propylene
Carbonates
photochromism
Gases
annealing

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics
  • Electrical and Electronic Engineering

Cite this

Martín, V. Cruz San ; Morales-Luna, M. ; García-Tinoco, P. E. ; Pérez-González, M. ; Arvizu, M. A. ; Crotte-Ledesma, H. ; Ponce-Mosso, M. ; Tomás, S. A. / Chromogenic MoO3 thin films : thermo-, photo-, and electrochromic response to working pressure variation in rf reactive magnetron sputtering. In: Journal of Materials Science: Materials in Electronics. 2018 ; Vol. 29, No. 18. pp. 15486-15495.
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abstract = "The thermochromic, photochromic, and electrochromic properties of molybdenum trioxide (MoO3) thin films were studied. MoO3 thin films were deposited by rf reactive magnetron sputtering and the influence of deposition parameters, i.e. O2/Ar gas ratio and working pressure, on the chromogenic properties was investigated. Thermochromism was induced by annealing the samples in either air or argon in the range 23–300 °C for 2 h. We found that the highest response was obtained for samples grown at 5.3 × 10−1 Pa, although films annealed in air showed a maximum coloration around 250 °C that became bleached above this temperature. As for the annealing in argon, the thermochromic effect increased even at 300 °C. By exposing samples to UV irradiation in air, photochromism could be induced for different intervals ranging from 0 to 3 h. The highest photochromic response was obtained for samples deposited at 1.3 Pa. Cyclic voltammetry for 20 cycles in a 1 M LiClO4 in propylene carbonate solution, inside a glovebox filled with argon, was used to evaluate the electrochromic response. Samples that showed optimum electrochromic response were deposited at 1.6 Pa. These results are explained in terms of the optical, structural, surface chemical composition, and vibrational modes.",
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Chromogenic MoO3 thin films : thermo-, photo-, and electrochromic response to working pressure variation in rf reactive magnetron sputtering. / Martín, V. Cruz San; Morales-Luna, M.; García-Tinoco, P. E.; Pérez-González, M.; Arvizu, M. A.; Crotte-Ledesma, H.; Ponce-Mosso, M.; Tomás, S. A.

In: Journal of Materials Science: Materials in Electronics, Vol. 29, No. 18, 01.09.2018, p. 15486-15495.

Research output: Contribution to journalArticle

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T2 - thermo-, photo-, and electrochromic response to working pressure variation in rf reactive magnetron sputtering

AU - Martín, V. Cruz San

AU - Morales-Luna, M.

AU - García-Tinoco, P. E.

AU - Pérez-González, M.

AU - Arvizu, M. A.

AU - Crotte-Ledesma, H.

AU - Ponce-Mosso, M.

AU - Tomás, S. A.

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N2 - The thermochromic, photochromic, and electrochromic properties of molybdenum trioxide (MoO3) thin films were studied. MoO3 thin films were deposited by rf reactive magnetron sputtering and the influence of deposition parameters, i.e. O2/Ar gas ratio and working pressure, on the chromogenic properties was investigated. Thermochromism was induced by annealing the samples in either air or argon in the range 23–300 °C for 2 h. We found that the highest response was obtained for samples grown at 5.3 × 10−1 Pa, although films annealed in air showed a maximum coloration around 250 °C that became bleached above this temperature. As for the annealing in argon, the thermochromic effect increased even at 300 °C. By exposing samples to UV irradiation in air, photochromism could be induced for different intervals ranging from 0 to 3 h. The highest photochromic response was obtained for samples deposited at 1.3 Pa. Cyclic voltammetry for 20 cycles in a 1 M LiClO4 in propylene carbonate solution, inside a glovebox filled with argon, was used to evaluate the electrochromic response. Samples that showed optimum electrochromic response were deposited at 1.6 Pa. These results are explained in terms of the optical, structural, surface chemical composition, and vibrational modes.

AB - The thermochromic, photochromic, and electrochromic properties of molybdenum trioxide (MoO3) thin films were studied. MoO3 thin films were deposited by rf reactive magnetron sputtering and the influence of deposition parameters, i.e. O2/Ar gas ratio and working pressure, on the chromogenic properties was investigated. Thermochromism was induced by annealing the samples in either air or argon in the range 23–300 °C for 2 h. We found that the highest response was obtained for samples grown at 5.3 × 10−1 Pa, although films annealed in air showed a maximum coloration around 250 °C that became bleached above this temperature. As for the annealing in argon, the thermochromic effect increased even at 300 °C. By exposing samples to UV irradiation in air, photochromism could be induced for different intervals ranging from 0 to 3 h. The highest photochromic response was obtained for samples deposited at 1.3 Pa. Cyclic voltammetry for 20 cycles in a 1 M LiClO4 in propylene carbonate solution, inside a glovebox filled with argon, was used to evaluate the electrochromic response. Samples that showed optimum electrochromic response were deposited at 1.6 Pa. These results are explained in terms of the optical, structural, surface chemical composition, and vibrational modes.

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