Characterization of the microlithography and mercury drop methods to generate PDI's

J.A. Zenteno-Hernández, F.S. Granados-Agustín, D. Aguirre-Aguirre, B. Villalobos-Mendoza, M.E. Percino-Zacarías, P. Rosales-Quintero, A. Cornejo-Rodriguez

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

In this work, we compare two techniques to make point-diffraction interferometers (PDI): microlithography and the mercury drop method to know with which of these the best results can be obtained. For the comparison, we used the wavefront generated by a commercial reference surface of /20 analyzing the interference pattern generated by the PDIs, we obtained information from the wavefront generated by the pinhole. Several PDIs were created and analyzed to have a statistical error information of both techniques.

Original languageEnglish
Title of host publicationOptical Manufacturing and Testing XII
EditorsRay Williamson, Dae Wook Kim, Rolf Rascher
Pages55
ISBN (Electronic)9781510620551
DOIs
Publication statusPublished - 1 Jan 2018
Externally publishedYes

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume10742
ISSN (Print)0277-786X
ISSN (Electronic)1996-756X

Bibliographical note

Funding Information:
J. A. Zenteno-Hernández1*, F. S. Granados-Agustín1, D. Aguirre-Aguirre2,3, B. Villalobos-Mendoza3,4, M. E. Percino-Zacarías1, P. Rosales-Quintero1, and A. Cornejo-Rodriguez1. 1Instituto Nacional de Astrofísica, Óptica y Electrónica, Luis Enrique Erro No.1, San Andrés Cholula 72840 Tonantzintla, Puebla, México 2Instituto de Ciencias Aplicadas y Tecnología, Universidad Nacional Autónoma de México, Cd. Universitaria, Apdo. Postal 70-186, C.P. 04510 CDMX, México 3Polo Universitario de Tecnología Avanzada, Universidad Nacional Autónoma de México, Vía de la Innovación No. 410, Autopista Monterrey-Aeropuerto Km. 10, PIIT C.P. 66629 Apodaca N.L., México 4Centro de Investigación y de Estudios Avanzados del Instituto Politécnico Nacional, Unidad Monterrey Vía del Conocimiento No. 201, Autopista Monterrey-Aeropuerto Km. 9.5, PIIT C.P. 66600 Apodaca N. L., México

Publisher Copyright:
© COPYRIGHT SPIE. Downloading of the abstract is permitted for personal use only.

Copyright:
Copyright 2018 Elsevier B.V., All rights reserved.

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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