Characterization of the microlithography and mercury drop methods to generate PDI's

J.A. Zenteno-Hernández; F.S. Granados-Agustín; D. Aguirre-Aguirre; B. Villalobos-Mendoza; M.E. Percino-Zacarías; P. Rosales-Quintero; A. Cornejo-Rodriguez

doi:10.1117/12.2320812

Characterization of the microlithography and mercury drop methods to generate PDI's

J.A. Zenteno-Hernández, F.S. Granados-Agustín, D. Aguirre-Aguirre, B. Villalobos-Mendoza, M.E. Percino-Zacarías, P. Rosales-Quintero, A. Cornejo-Rodriguez

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

In this work, we compare two techniques to make point-diffraction interferometers (PDI): microlithography and the mercury drop method to know with which of these the best results can be obtained. For the comparison, we used the wavefront generated by a commercial reference surface of /20 analyzing the interference pattern generated by the PDIs, we obtained information from the wavefront generated by the pinhole. Several PDIs were created and analyzed to have a statistical error information of both techniques.

Original language	English
Title of host publication	Optical Manufacturing and Testing XII
Editors	Ray Williamson, Dae Wook Kim, Rolf Rascher
Pages	55
ISBN (Electronic)	9781510620551
DOIs	https://doi.org/10.1117/12.2320812
Publication status	Published - 1 Jan 2018
Externally published	Yes

Publication series

Name	Proceedings of SPIE - The International Society for Optical Engineering
Volume	10742
ISSN (Print)	0277-786X
ISSN (Electronic)	1996-756X

Bibliographical note

Funding Information:
J. A. Zenteno-Hernández1*, F. S. Granados-Agustín1, D. Aguirre-Aguirre2,3, B. Villalobos-Mendoza3,4, M. E. Percino-Zacarías1, P. Rosales-Quintero1, and A. Cornejo-Rodriguez1. 1Instituto Nacional de Astrofísica, Óptica y Electrónica, Luis Enrique Erro No.1, San Andrés Cholula 72840 Tonantzintla, Puebla, México 2Instituto de Ciencias Aplicadas y Tecnología, Universidad Nacional Autónoma de México, Cd. Universitaria, Apdo. Postal 70-186, C.P. 04510 CDMX, México 3Polo Universitario de Tecnología Avanzada, Universidad Nacional Autónoma de México, Vía de la Innovación No. 410, Autopista Monterrey-Aeropuerto Km. 10, PIIT C.P. 66629 Apodaca N.L., México 4Centro de Investigación y de Estudios Avanzados del Instituto Politécnico Nacional, Unidad Monterrey Vía del Conocimiento No. 201, Autopista Monterrey-Aeropuerto Km. 9.5, PIIT C.P. 66600 Apodaca N. L., México

Publisher Copyright:
© COPYRIGHT SPIE. Downloading of the abstract is permitted for personal use only.

Copyright:
Copyright 2018 Elsevier B.V., All rights reserved.

All Science Journal Classification (ASJC) codes

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Computer Science Applications
Applied Mathematics
Electrical and Electronic Engineering

Access to Document

10.1117/12.2320812

Cite this

Zenteno-Hernández, J. A., Granados-Agustín, F. S., Aguirre-Aguirre, D., Villalobos-Mendoza, B., Percino-Zacarías, M. E., Rosales-Quintero, P., & Cornejo-Rodriguez, A. (2018). Characterization of the microlithography and mercury drop methods to generate PDI's. In R. Williamson, D. W. Kim, & R. Rascher (Eds.), Optical Manufacturing and Testing XII (pp. 55). Article 107421E (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 10742). https://doi.org/10.1117/12.2320812

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abstract = "In this work, we compare two techniques to make point-diffraction interferometers (PDI): microlithography and the mercury drop method to know with which of these the best results can be obtained. For the comparison, we used the wavefront generated by a commercial reference surface of /20 analyzing the interference pattern generated by the PDIs, we obtained information from the wavefront generated by the pinhole. Several PDIs were created and analyzed to have a statistical error information of both techniques.",

author = "J.A. Zenteno-Hern{\'a}ndez and F.S. Granados-Agust{\'i}n and D. Aguirre-Aguirre and B. Villalobos-Mendoza and M.E. Percino-Zacar{\'i}as and P. Rosales-Quintero and A. Cornejo-Rodriguez",

note = "Funding Information: J. A. Zenteno-Hern{\'a}ndez1*, F. S. Granados-Agust{\'i}n1, D. Aguirre-Aguirre2,3, B. Villalobos-Mendoza3,4, M. E. Percino-Zacar{\'i}as1, P. Rosales-Quintero1, and A. Cornejo-Rodriguez1. 1Instituto Nacional de Astrof{\'i}sica, {\'O}ptica y Electr{\'o}nica, Luis Enrique Erro No.1, San Andr{\'e}s Cholula 72840 Tonantzintla, Puebla, M{\'e}xico 2Instituto de Ciencias Aplicadas y Tecnolog{\'i}a, Universidad Nacional Aut{\'o}noma de M{\'e}xico, Cd. Universitaria, Apdo. Postal 70-186, C.P. 04510 CDMX, M{\'e}xico 3Polo Universitario de Tecnolog{\'i}a Avanzada, Universidad Nacional Aut{\'o}noma de M{\'e}xico, V{\'i}a de la Innovaci{\'o}n No. 410, Autopista Monterrey-Aeropuerto Km. 10, PIIT C.P. 66629 Apodaca N.L., M{\'e}xico 4Centro de Investigaci{\'o}n y de Estudios Avanzados del Instituto Polit{\'e}cnico Nacional, Unidad Monterrey V{\'i}a del Conocimiento No. 201, Autopista Monterrey-Aeropuerto Km. 9.5, PIIT C.P. 66600 Apodaca N. L., M{\'e}xico Publisher Copyright: {\textcopyright} COPYRIGHT SPIE. Downloading of the abstract is permitted for personal use only. Copyright: Copyright 2018 Elsevier B.V., All rights reserved.",

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doi = "10.1117/12.2320812",

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Zenteno-Hernández, JA, Granados-Agustín, FS, Aguirre-Aguirre, D, Villalobos-Mendoza, B, Percino-Zacarías, ME, Rosales-Quintero, P & Cornejo-Rodriguez, A 2018, Characterization of the microlithography and mercury drop methods to generate PDI's. in R Williamson, DW Kim & R Rascher (eds), Optical Manufacturing and Testing XII., 107421E, Proceedings of SPIE - The International Society for Optical Engineering, vol. 10742, pp. 55. https://doi.org/10.1117/12.2320812

Characterization of the microlithography and mercury drop methods to generate PDI's. / Zenteno-Hernández, J.A.; Granados-Agustín, F.S.; Aguirre-Aguirre, D. et al.
Optical Manufacturing and Testing XII. ed. / Ray Williamson; Dae Wook Kim; Rolf Rascher. 2018. p. 55 107421E (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 10742).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

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N2 - In this work, we compare two techniques to make point-diffraction interferometers (PDI): microlithography and the mercury drop method to know with which of these the best results can be obtained. For the comparison, we used the wavefront generated by a commercial reference surface of /20 analyzing the interference pattern generated by the PDIs, we obtained information from the wavefront generated by the pinhole. Several PDIs were created and analyzed to have a statistical error information of both techniques.

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Zenteno-Hernández JA, Granados-Agustín FS, Aguirre-Aguirre D, Villalobos-Mendoza B, Percino-Zacarías ME, Rosales-Quintero P et al. Characterization of the microlithography and mercury drop methods to generate PDI's. In Williamson R, Kim DW, Rascher R, editors, Optical Manufacturing and Testing XII. 2018. p. 55. 107421E. (Proceedings of SPIE - The International Society for Optical Engineering). doi: 10.1117/12.2320812

Characterization of the microlithography and mercury drop methods to generate PDI's

Abstract

Publication series

Bibliographical note

All Science Journal Classification (ASJC) codes

Access to Document

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